Prof. Matteo Cocuzza

• The didactic material (slides for the lectures) will be distributed in pdf format by the teacher and uploaded on the Didactic Portal before the course start.

Argomenti del programma: Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary…

• The didactic material (slides for the lectures) will be distributed in pdf format by the teachers and uploaded on the Didactic Portal before the course start. Some optional additive readings (i.e.

Argomenti del programma: Micro and nano-scale technologies (30 h): ● Substrate preparation and crystallography (1,5 h) ● Cleanroom technology (1,5 h) ● Silicon oxidation (1,5 h) ● Epitaxy (VPE, LPE, MBE, CBE), CVD (APCVD, LPCVD, PECVD, MOCVD, ICPCVD), ALD, PVD (evaporation, sputtering), electroplating (6 h) ● Doping by diffusion and by ion implantation (3 h) ● Lithography (optical, e-beam, SPM) and advanced lithography (EUV, NIL, block…