Milton Ohring – Materials Science of Thin Films 2nd Edition
Libro adottato a Politecnico di Milano, a.a. 2026/2027 · 5 canali
«Milton Ohring – Materials Science of Thin Films 2nd Edition» è adottato per Advanced Micro And Nanofabrication Technologies dal prof. Daniela Petti (Engineering Physics, Ingegneria Fisica, Materials Engineering and Nanotechnology e altri corsi – Politecnico di Milano); per Imaging And Fabrication Of Micro And Nanostructures (C.I.) dal prof. Daniela Petti (Engineering Physics – Politecnico di Milano).
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Come lo indica il docente: Milton Ohring, Materials Science of Thin Films 2nd Edition, Academic Press, Anno edizione: 2002, ISBN: 978-0125249751 Note: (Part I of the course)
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
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