Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
Argomenti del programma: Part I - Deposition Introduction: objectives, examples. Vacuum technology: pressure, gas transport, vacuum systems. Surface thermodynamics: surface properties, nucleation, and film growth modes. Film epitaxy: mechanisms and the effect of strain. Thermal evaporation: vapour pressure, deposition rate, and uniformity; electrical and e-beam evaporation, molecular beam epitaxy, pulsed laser deposition.
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